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- Kim, Soo-Hyun
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Highly conductive ALD-WCx thin films using a novel fluorine-free W precursor for Cu & Ru interconnects
- Author(s)
- Seo, Dongbeom, Kim, Sang Bok, Kim, Soo-Hyun
- Issued Date
- 2025-12-11
- Citation
- The 14th International Conference on Advanced Materials and Devices (ICAMD 2025)
- Publisher
- Applied Physics Division, Korean Physical Society (KPS)
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