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Kim, So Youn
Laboratory for Soft Materials Nanophysics
Research Interests
  • Colloids, particle dispersions, polymer nanocomposite, block copolymers

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Large-Area Nanosquare Arrays from Shear-Aligned Block Copolymer Thin Films

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Title
Large-Area Nanosquare Arrays from Shear-Aligned Block Copolymer Thin Films
Author
Kim, So YounNunns, AdamGwyther, JessicaDavis, Raleigh L.Manners, IanChaikin, Paul M.Register, Richard A.
Issue Date
2014-10
Publisher
AMER CHEMICAL SOC
Citation
NANO LETTERS, v.14, no.10, pp.5698 - 5705
Abstract
While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated
URI
https://scholarworks.unist.ac.kr/handle/201301/8894
DOI
10.1021/nl502416b
ISSN
1530-6984
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