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허민섭

Hur, Min Sup
Computational Plasma Lab.
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dc.citation.endPage L531 -
dc.citation.number 5B -
dc.citation.startPage L528 -
dc.citation.title JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS -
dc.citation.volume 40 -
dc.contributor.author Lee, JK -
dc.contributor.author Dastgeer, S -
dc.contributor.author Shon, CH -
dc.contributor.author Hur, Min Sup -
dc.contributor.author Kim, HC -
dc.contributor.author Cho, SW -
dc.date.accessioned 2023-12-22T11:44:30Z -
dc.date.available 2023-12-22T11:44:30Z -
dc.date.created 2014-11-12 -
dc.date.issued 2001-05 -
dc.description.abstract The striation mechanism of dielectric microdischarges, as in many plasma devices, is extensively explored by collisional kinetic and fluid simulations. Striation in a typical dielectric microdischarge device predominantly occurs near the anode region and is basically governed by the ionization-dominated α-processes, wherein surface and space charges collectively dictate the phenomenon in a complex manner. A novel type of striation has been investigated by us near the cathode region, which is dominated by γ-processes and is driven by the secondary-electron emission mechanism. -
dc.identifier.bibliographicCitation JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.40, no.5B, pp.L528 - L531 -
dc.identifier.doi 10.1143/JJAP.40.L528 -
dc.identifier.issn 0021-4922 -
dc.identifier.scopusid 2-s2.0-0035872522 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/8803 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0035872522 -
dc.identifier.wosid 000170777800014 -
dc.language 영어 -
dc.publisher INST PURE APPLIED PHYSICS -
dc.title Striation mechanism and triggered striation in dielectric microdischarge plasma -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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