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DC Field | Value | Language |
---|---|---|
dc.citation.endPage | L531 | - |
dc.citation.number | 5B | - |
dc.citation.startPage | L528 | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | - |
dc.citation.volume | 40 | - |
dc.contributor.author | Lee, JK | - |
dc.contributor.author | Dastgeer, S | - |
dc.contributor.author | Shon, CH | - |
dc.contributor.author | Hur, Min Sup | - |
dc.contributor.author | Kim, HC | - |
dc.contributor.author | Cho, SW | - |
dc.date.accessioned | 2023-12-22T11:44:30Z | - |
dc.date.available | 2023-12-22T11:44:30Z | - |
dc.date.created | 2014-11-12 | - |
dc.date.issued | 2001-05 | - |
dc.description.abstract | The striation mechanism of dielectric microdischarges, as in many plasma devices, is extensively explored by collisional kinetic and fluid simulations. Striation in a typical dielectric microdischarge device predominantly occurs near the anode region and is basically governed by the ionization-dominated α-processes, wherein surface and space charges collectively dictate the phenomenon in a complex manner. A novel type of striation has been investigated by us near the cathode region, which is dominated by γ-processes and is driven by the secondary-electron emission mechanism. | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.40, no.5B, pp.L528 - L531 | - |
dc.identifier.doi | 10.1143/JJAP.40.L528 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.scopusid | 2-s2.0-0035872522 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/8803 | - |
dc.identifier.url | http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0035872522 | - |
dc.identifier.wosid | 000170777800014 | - |
dc.language | 영어 | - |
dc.publisher | INST PURE APPLIED PHYSICS | - |
dc.title | Striation mechanism and triggered striation in dielectric microdischarge plasma | - |
dc.type | Article | - |
dc.description.journalRegisteredClass | scopus | - |
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