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Shin, Tae Joo
Synchrotron Radiation Research Lab.
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Research on Silicon Oxynitride Thin Films Deposited by PECVD Processes with Low-GWP Gas

Author(s)
Shin, Tae JooJang, Woo Cheol
Issued Date
2024-11-20
URI
https://scholarworks.unist.ac.kr/handle/201301/85812
Citation
PSA-24: 9th International Symposium on Practical Surface Analysis
Publisher
The Surface Analysis Society of Japan & Korean Society of Surface Analysis

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