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- Kim, Soo-Hyun
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Impurity Reduction Leading to Enhanced Properties in Atomic Layer Deposited Ru Films by Introducing Additional Reactant for Cu Alternative Interconnects
- Author(s)
- Son, Yeseul, Hong, Tae Eun, Kim, Sang Bok, Bae, Jong-Seong, Kim, Jeongha, Kim, Soo-Hyun
- Issued Date
- 2024-11-20
- Citation
- 9th International Symposium on Practical Surface Analysis (PSA-24)
- Publisher
- PSA-24
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