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- Kim, Soo-Hyun
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Improved properties of atomic layer deposited Ru films by providing additional reactant for Cu alternative interconnects
- Author(s)
- Kim, Jeongha, Son, Yeseul, Cheon, Taehoon, Kim, Sang Bok, Kim, Soo-Hyun
- Issued Date
- 2024-08-06
- Citation
- AVS 24th International Conference on Atomic Layer Deposition
- Publisher
- AVS
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