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Characteristics of a graphene field effect transistor with al₂o₃/sio₂ gate insulator stack: a potential alternative for conventional memory structures

Author(s)
LEE, Saehee
Advisor
Park, Kibog
Issued Date
2024-02
URI
https://scholarworks.unist.ac.kr/handle/201301/82232 http://unist.dcollection.net/common/orgView/200000743369
Publisher
Ulsan National Institute of Science and Technology
Degree
Master
Major
Graduate School of Semiconductor Materials and Devices Engineering

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