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Yoon, Tae-Sik
Nano Semiconductor Research Lab.
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Process-dependent Synaptic and Nonvolatile Memory Characteristics in Thin-film Transistors with HfOx Gate Insulator and ZnO Channel Layer

Author(s)
Lee, HyerinBeom, KeonwonKim, MinjuYoon, Tae-Sik
Issued Date
2020-02-13
URI
https://scholarworks.unist.ac.kr/handle/201301/78598
Citation
제27회 한국반도체학술대회
Publisher
한국반도체연구조합

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