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박장웅

Park, Jang-Ung
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Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks

Author(s)
Jeon, SPark, Jang-UngCirelli, RYang, SHeitzman, CEBraun, PVKenis, PJARogers, JA
Issued Date
2004-08
DOI
10.1073/pnas.0403048101
URI
https://scholarworks.unist.ac.kr/handle/201301/7741
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=4344674672
Citation
PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, v.101, no.34, pp.12428 - 12433
Abstract
High-resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of 3D nanostructures that are technologically important but difficult to generate in other ways. In this approach, light passing through a phase mask that has features of relief comparable in dimension to the wavelength generates a 3D distribution of intensity that exposes a photopolymer film throughout its thickness. Developing this polymer yields a structure in the geometry of the intensity distribution, with feature sizes as small as 50 nm. Rigorous coupled-wave analysis reveals the fundamental aspects of the optics associated with this method; a broad-range 3D nanostructures patterned with it demonstrates its technical capabilities. A nanoporous filter element built inside a microfluidic channel represents one example of the many types of functional devices that can be constructed.
Publisher
NATL ACAD SCIENCES
ISSN
0027-8424

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