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박장웅

Park, Jang-Ung
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Collapse of stamps for soft lithography due to interfacial adhesion

Author(s)
Hsia, KJHuang, YMenard, EPark, Jang-UngZhou, WRogers, JFulton, JM
Issued Date
2005-04
DOI
10.1063/1.1900303
URI
https://scholarworks.unist.ac.kr/handle/201301/7740
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=20844437052
Citation
APPLIED PHYSICS LETTERS, v.86, no.15, pp.1 - 3
Abstract
Collapse of elastomeric elements used for pattern transfer in soft lithography is studied through experimental measurements and theoretical modehng. The objective is to identify the driving force for such collapse. Two potential driving forces, the self-weight of the stamp and the interfacial adhesion, are investigated. An idealized configuration of periodic rectangular grooves and flat punches is considered. Experimental observations demonstrate that groove collapse occurs regardless of whether the gravitational force promotes or suppresses such collapse, indicating that self-weight is not the driving force. On the other hand, model predictions based on the postulation that interfacial adhesion is the driving force exhibit excellent agreement with the experimentally measured collapse behavior. The interfacial adhesion energy is also evaluated by matching an adhesion parameter in the model with the experimental data.
Publisher
AMER INST PHYSICS
ISSN
0003-6951

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