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김성엽

Kim, Sung Youb
Computational Advanced Nanomechanics Lab.
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Transition-pathway models of atomic diffusion on fcc metal surfaces. I. Flat surfaces

Author(s)
Kim, Sung YoubLee, In-HoJun, Sukky
Issued Date
2007-12
DOI
10.1103/PhysRevB.76.245407
URI
https://scholarworks.unist.ac.kr/handle/201301/7377
Fulltext
https://journals.aps.org/prb/abstract/10.1103/PhysRevB.76.245407
Citation
PHYSICAL REVIEW B, v.76, no.24, pp.245407
Abstract
Numerical calculation of minimum-energy paths and activation energy barriers for various atomic diffusion processes on fcc metal surfaces are presented. The computational method employed is the action-derived molecular dynamics that searches the approximate Newtonian trajectory on potential-energy surfaces. The minimization of a modified action, which facilitates the conservation of total energy and the control of kinetic energy, enables us to find efficiently the minimum-energy paths of complex microscopic processes. Diverse diffusion mechanisms on flat fcc substrates are investigated in this first part of the series. More complicated systems including surface steps are simulated in paper II.
Publisher
AMER PHYSICAL SOC
ISSN
2469-9950
Keyword
ADATOM SELF-DIFFUSIONMOLECULAR-DYNAMICS SIMULATIONISLAND MORPHOLOGYCU(001) SURFACESINGLE ADATOMSTIME-SCALECU ADATOMSLONG JUMPSGROWTHMECHANISM

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