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박수진

Park, Soojin
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Unexpected hexagonally perforated layer morphology of PS-b-PMMA block copolymer in supported thin film

Author(s)
Park, IPark, SoojinPark, HWChang, TYang, HCRyu, CY
Issued Date
2006-01
DOI
10.1021/ma0515937
URI
https://scholarworks.unist.ac.kr/handle/201301/6526
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=30944456155
Citation
MACROMOLECULES, v.39, no.1, pp.315 - 318
Abstract
Block copolymer ordering in thin films on a preferentially wetting flat substrate is studied using a polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer, which forms PMMA cylinders in bulk. Tapping-mode AFM and cross-sectional TEM were employed to characterize the thin film ordered structure of the PS-b-PMMA on a flat silicon surface with native oxide that is preferentially wetted by PMMA blocks. The PS-b-PMMA in thin film develops hexagonally perforated layer (HPL), which is different from its cylindrical bulk morphology. The HPL structure of PS-b-PMMA exhibits islands and holes at the surface, which persists up to the film thickness as high as 6L 0. Surface-induced reorganization of the block copolymers on PMMA-preferring flat surface may be responsible for the formation of the layerlike nonbulk structure of HPL, which has been templated from the flat surface and propagated into a multilayered HPL films.
Publisher
AMER CHEMICAL SOC
ISSN
0024-9297

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