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Edge Reconstruction-Dependent Growth Kinetics of MoS2

Author(s)
Dong, JichenDing, DegongJin, ChuanhongLiu, YunqiDing, Feng
Issued Date
2023-01
DOI
10.1021/acsnano.2c05397
URI
https://scholarworks.unist.ac.kr/handle/201301/61551
Citation
ACS NANO, v.17, no.1, pp.127 - 136
Abstract
Understanding the growth mechanisms of multielement two-dimensional (2D) crystals is challenging because of the unbalanced stoichiometry and possible reconstruction of their edges. Here, we present a systematic theoretical study on the chemical vapor deposition (CVD) growth mechanism of MoS2. We found that the growth kinetics of MoS2 highly depends on its edge reconstruction determined by concentrations of Mo and S in the growth environment. Based on the calculated energies of nucleation and propagation of various MoS2 edges, we predicted the transition of a MoS2 island growth from a regime of a triangle enclosed by Mo-terminated zigzag edges that are passivated by 50% S (Mo-II edges), to a regime of continuous evolution within a triangle, hexagon, and inverted triangle with 75%-S-terminated edges (S-III edges) and Mo-II edges, and finally to a regime of triangles with Mo-terminated zigzag edges that are passivated by 100% S (Mo-III edges) by tuning the growth condition from Mo-rich to S-rich, which provides a reasonable explanation to many experimental observations. This study provides a general guideline on theoretical studies of 2D crystals' growth mechanisms, deepens our understanding on the growth mechanism of multielement 2D crystals, and is beneficial for the controllable synthesis of various 2D crystals.
Publisher
AMER CHEMICAL SOC
ISSN
1936-0851
Keyword (Author)
MoS2edge reconstructiongrowth kineticschemical vapor depositiontheoretical simulations
Keyword
CHEMICAL-VAPOR-DEPOSITIONGRAPHENEEQUILIBRIUMCRYSTALSSHAPETERMINATIONMECHANISMEVOLUTIONINSIGHTSURFACE

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