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Shin, Tae Joo
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Nondestructive Photopatterning of Heavy-Metal-Free Quantum Dots

Author(s)
Yang, JeehyeLee, MyeongjaePark, Se YoungPark, MyoungjinKim, JonghoonSitapure, NiranjanHahm, DonghyoRhee, SeunghyunLee, DaeyeonJo, HyunwooJo, Yong HyunLim, JaeminKim, JungwookShin, Tae JooLee, Doh C.Kwak, KyungwonKwon, Joseph S.Kim, BongSooBae, Wan KiKang, Moon Sung
Issued Date
2022-10
DOI
10.1002/adma.202205504
URI
https://scholarworks.unist.ac.kr/handle/201301/59763
Fulltext
https://onlinelibrary.wiley.com/doi/10.1002/adma.202205504
Citation
ADVANCED MATERIALS, v.34, no.43, pp.2205504
Abstract
Electroluminescence from quantum dots (QDs) is a suitable photon source for futuristic displays offering hyper-realistic images with free-form factors. Accordingly, a nondestructive and scalable process capable of rendering multicolored QD patterns on a scale of several micrometers needs to be established. Here, nondestructive direct photopatterning for heavy-metal-free QDs is reported using branched light-driven ligand crosslinkers (LiXers) containing multiple azide units. The branched LiXers effectively interlock QD films via photo-crosslinking native aliphatic QD surface ligands without compromising the intrinsic optoelectronic properties of QDs. Using branched LiXers with six sterically engineered azide units, RGB QD patterns are achieved on the micrometer scale. The photo-crosslinking process does not affect the photoluminescence and electroluminescence characteristics of QDs and extends the device lifetime. This nondestructive method can be readily adapted to industrial processes and make an immediate impact on display technologies, as it uses widely available photolithography facilities and high-quality heavy-metal-free QDs with aliphatic ligands.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
0935-9648
Keyword (Author)
heavy-metal-free quantum dotshigh-resolution patterningligand crosslinkingphotopatterning
Keyword
DIRECT OPTICAL LITHOGRAPHYHIGHLY EFFICIENTCROSS-LINKINGDEEP-UVNANOCRYSTALSROBUSTLIGHT-EMITTING-DIODES

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