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Synthesis of Isotopically-Labeled Graphite Films by Cold-Wall Chemical Vapor Deposition and Electronic Properties of Graphene Obtained from Such Films

Author(s)
Cai, WeiweiPiner, Richard D.Zhu, YanwuLi, XuesongTan, ZhenbingFloresca, Herman CarloYang, ChangliLu, LiKim, M. J.Ruoff, Rodney S.
Issued Date
2009-11
DOI
10.1007/s12274-009-9083-y
URI
https://scholarworks.unist.ac.kr/handle/201301/54350
Fulltext
https://link.springer.com/article/10.1007%2Fs12274-009-9083-y
Citation
NANO RESEARCH, v.2, no.11, pp.851 - 856
Abstract
We report the synthesis of isotopically-labeled graphite films on nickel substrates by using cold-wall chemical vapor deposition (CVD). During the synthesis, carbon from C-12- and C-13-methane was deposited on, and dissolved in, a nickel foil at high temperature, and a uniform graphite film was segregated from the nickel surface by cooling the sample to room temperature. Scanning and transmission electron microscopy, micro-Raman spectroscopy, and X-ray diffraction prove the presence of a graphite film. Monolayer graphene films obtained from such isotopically-labeled graphite films by mechanical methods have electron mobility values greater than 5000 cm(2) . V-1 . s(-1) at low temperatures. Furthermore, such films exhibit the half-integer quantum Hall effect over a wide temperature range from 2 K to 200 K, implying that the graphite grown by this cold-wall CVD approach has a quality as high as highly oriented pyrolytic graphite (HOPG). The results from transport measurements indicate that C-13-labeling does not significantly affect the electrical transport properties of graphene.
Publisher
TSINGHUA UNIV PRESS
ISSN
1998-0124
Keyword (Author)
Chemical vapor deposition (CVD)isotopically-labeled graphitegraphene
Keyword
DIAMONDGROWTHOXIDE

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