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Graphene Growth and Device Integration

Author(s)
Colombo, LuigiWallace, Robert M.Ruoff, Rodney S.
Issued Date
2013-07
DOI
10.1109/JPROC.2013.2260114
URI
https://scholarworks.unist.ac.kr/handle/201301/49871
Citation
Proceedings of the IEEE, v.101, no.7, pp.1536 - 1556
Abstract
Graphene has been introduced to the electronics community as a potentially useful material for scaling electronic devices to meet low-power and high-performance targets set by the semiconductor industry international road-map, radio-frequency (RF) devices, and many more applications. Growth and integration of graphene for any device is challenging and will require significant effort and innovation to address the many issues associated with integrating the monolayer, chemically inert surface with metals and dielectrics. In this paper, we review the growth and integration of graphene for simple field-effect transistors and present physical and electrical data on the integrated graphene with metals and dielectrics.
Publisher
Institute of Electrical and Electronics Engineers
ISSN
0018-9219
Keyword (Author)
Chemical vapor deposition (CVD)electrochemical transfergraphenemobilityRaman spectroscopyX-ray photoelectron spectroscopy
Keyword
ATOMIC LAYER DEPOSITIONFIELD-EFFECT TRANSISTORSBILAYER GRAPHENEBORON-NITRIDEELECTRONIC-STRUCTUREEPITAXIAL GRAPHENEHIGH-QUALITYTRANSPORT-PROPERTIESCURRENT SATURATIONCARBON NANOTUBES

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