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Lee, Zonghoon
Atomic-Scale Electron Microscopy (ASEM) Lab
Research Interests
  • Advanced Transmission Electron Microscopy (TEM/STEM), in Situ TEM, graphene, 2D materials, low-dimensional crystals, nanostructured materials

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Co clustering and ferromagnetism in chemical vapor deposited Ti1-xCoxO2-delta thin films

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Title
Co clustering and ferromagnetism in chemical vapor deposited Ti1-xCoxO2-delta thin films
Author
Kang, Sueng-HeeNguyen, HoaQuynh, ThiYoon, Soon-GilKim, Eui-TaeLee, ZonghoonRadmilovic, Velimir
Keywords
ROOM-TEMPERATURE FERROMAGNETISM; TIO2
Issue Date
2007-03
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.90, no.10, pp.1 - 3
Abstract
Stoichiometric Ti1-xCoxO2 and oxygen-deficient Ti1-xCoxO2-delta thin films were grown on Si (001) by plasma-enhanced metal-organic chemical vapor deposition and their microstructures and ferromagnetic properties were investigated. The stoichiometric film grown at 430 degrees C showed no discernable Co metal clustering or measurable coercive field. In contrast, oxygen-deficient films fabricated without supplying O-2 contained significant Co clusters of similar to 10-20 nm, which appeared to be the major reason for the observed room-temperature ferromagnetism. With increasing oxygen vacancies of the films, the coercive field and saturation magnetization values increased to similar to 460 Oe and similar to 27 emu/cm(3) (1.55 mu(B)/Co atom) approached that for bulk cobalt, respectively.
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DOI
10.1063/1.2711184
ISSN
0003-6951
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MSE_Journal Papers
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