Fabricating a multi-level barrier-integrated microfluidic device using grey-scale photolithography
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- Fabricating a multi-level barrier-integrated microfluidic device using grey-scale photolithography
- Nam, Yoonkwang; Kim, Minseok; Kim, Taesung
- SINGLE-EXPOSURE PHOTOLITHOGRAPHY; GRAYSCALE MASKS; SYSTEM
- Issue Date
- IOP PUBLISHING LTD
- JOURNAL OF MICROMECHANICS AND MICROENGINEERING, v.23, no.10, pp.1 - 7
- Most polymer-replica-based microfluidic devices are mainly fabricated by using standard soft-lithography technology so that multi-level masters (MLMs) require multiple spin-coatings, mask alignments, exposures, developments, and bakings. In this paper, we describe a simple method for fabricating MLMs for planar microfluidic channels with multi-level barriers (MLBs). A single photomask is necessary for standard photolithography technology to create a polydimethylsiloxane grey-scale photomask (PGSP), which adjusts the total amount of UV absorption in a negative-tone photoresist via a wide range of dye concentrations. Since the PGSP in turn adjusts the degree of cross-linking of the photoresist, this method enables the fabrication of MLMs for an MLB-integrated microfluidic device. Since the PGSP-based soft-lithography technology provides a simple but powerful fabrication method for MLBs in a microfluidic device, we believe that the fabrication method can be widely used for micro total analysis systems that benefit from MLBs. We demonstrate an MLB-integrated microfluidic device that can separate microparticles.
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