Fabrication of Disposable Topographic Silicon Oxide from Sawtoothed Patterns: Control of Arrays of Gold Nanoparticles
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- Fabrication of Disposable Topographic Silicon Oxide from Sawtoothed Patterns: Control of Arrays of Gold Nanoparticles
- Cho, Heesook; Yoo, Hana; Park, Soojin
- Block copolymer thin films; Glass surfaces; Gold Nanoparticles; Gold precursor; Gold salts; Imprinting process; Micellar structures; Oxygen plasma treatments; Oxygen plasmas; Poly(2-vinylpyridine) (P2VP); Polydimethylsiloxane PDMS; Solvent annealing; Thermal-annealing; Thin layers; Wet-etching process
- Issue Date
- AMER CHEMICAL SOC
- LANGMUIR, v.26, no.10, pp.7451 - 7457
- Disposable topographic silicon oxide patterns were fabricated from polymeric replicas of sawtoothed glass surfaces, spin-coating of poly(dimethylsiloxane) (PDMS) thin films, and thermal annealing at certain temperature and followed by oxygen plasma treatment of the thin PDMS layer. A simple imprinting process was used to fabricate the replicated PDMS and PS patterns from sawtoothed glass surfaces. Next, thin layers of PDMS films having different thicknesses were spin-coated onto the sawtoothed PS surfaces and annealed at 60 degrees C to be drawn the PDMS into the valley of the sawtoothed PS surfaces, followed by oxygen plasma treatment to fabricate topographic silicon oxide patterns. By control of the thickness of PDMS layers, silicon oxide patterns having various line widths were fabricated. The silicon oxide topographic patterns were used to direct the self-assembly of polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) block copolymer thin films via solvent annealing process. A highly ordered PS-b-P2VP micellar structure was used to let gold precursor complex with P2VP chains, and followed by oxygen plasma treatment. When the PS-b-P2VP thin films containing gold salts were exposed to oxygen plasma environments, gold salts were reduced to pure gold nanoparticles without changing high degree of lateral order, while polymers were completely degraded. As the width of trough and crest in topographic patterns increases, the number of gold arrays and size of gold nanoparticles are tuned. In the final step, the silicon oxide topographic patterns were selectively removed by wet etching process without changing the arrays of gold nanoparticles.
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