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Park, Soojin
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Extremely Superhydrophobic Surfaces with Micro- and Nanostructures Fabricated by Copper Catalytic Etching

Author(s)
Lee, Jung-PilChoi, SinhoPark, Soojin
Issued Date
2011-01
DOI
10.1021/la1045354
URI
https://scholarworks.unist.ac.kr/handle/201301/3438
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=78651302313
Citation
LANGMUIR, v.27, no.2, pp.809 - 814
Abstract
We demonstrate a simple method for the fabrication of rough silicon surfaces with micro- and nanostructures, which exhibited superhydrophobic behaviors. Hierarchically rough silicon surfaces were prepared by copper (Cu)-assisted chemical etching process where Cu nanoparticles having particle size of 10-30 nm were deposited on silicon surface, depending on the period of time of electroless Cu plating. Surface roughness was controlled by both the size of Cu nanoparticles and etching conditions. As-synthesized rough silicon surfaces showed water contact angles ranging from 93 degrees to 149 degrees. Moreover, the hierarchically rough silicon surfaces were chemically modified by spin-coating of a thin layer of Teflon precursor with low surface energy. And thus it exhibited nonsticky and enhanced hydrophobic properties with extremely high contact angle of nearly 180 degrees.
Publisher
AMER CHEMICAL SOC
ISSN
0743-7463

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