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GrzybowskiBartosz Andrzej

Grzybowski, Bartosz A.
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Maskless microetching of transparent conductive oxides (ITO and ZnO) and semiconductors (GaAs) based on reaction-diffusion

Author(s)
Smoukov, Stoyan K.Grzybowski, Bartosz A.
Issued Date
2006-10
DOI
10.1021/cm061468p
URI
https://scholarworks.unist.ac.kr/handle/201301/33370
Fulltext
https://pubs.acs.org/doi/10.1021/cm061468p
Citation
CHEMISTRY OF MATERIALS, v.18, no.20, pp.4722 - 4723
Publisher
AMER CHEMICAL SOC
ISSN
0897-4756
Keyword
FILMSLASER

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