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Yang, Changduk
Advanced Tech-Optoelectronic Materials Synthesis Lab (ATOMS)
Research Interests
  • Optoelectronic materials synthesis/organic electronics, functionalization of carbonaceous solids, advanced materials chemistry, macromolecular chemistry

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Regular H-Bonding-Containing Polymers with Stretchability up to 100% External Strain for Self-Healable Plastic Transistors

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Title
Regular H-Bonding-Containing Polymers with Stretchability up to 100% External Strain for Self-Healable Plastic Transistors
Author
Lee, Moo YeolDharmapurikar, SatejLee, Sang JinCho, YongjoonYang, ChangdukOh, Joon Hak
Issue Date
2020-03
Publisher
AMER CHEMICAL SOC
Citation
CHEMISTRY OF MATERIALS, v.32, no.5, pp.1914 - 1924
Abstract
Intrinsically stretchable, electroactive materials featuring self-healing abilities will allow for a variety of next-generation stretchable electronics. Here, we synthesize diketopyrrolopyrrole-based "alternating" copolymers with urethane-containing side chains, that is, PDPPurethane copolymers, and use them as active layers in intrinsically stretchable and self-healable plastic transistors. The long-branched urethane side chains possessing moderate H-bonding strength enable sufficient solubility and excellent dynamic bonding, facilitating the stress dissipation under mechanical deformation. PDPPurethane thin films exhibit outstanding stretchability up to 100% external strain without degradation of electrical performance in the organic transistor platform. They also feature self-healing properties with the healing of cracks and the recovery of electrical properties after treatment. The structure-property relationships of PDPPurethane thin films under strain have been thoroughly investigated using a variety of characterization methods. Our results demonstrate a viable approach for the development of stretchable and self-healable plastic electronics using stretchable, semiconducting copolymers obtained via side chain engineering.
URI
https://scholarworks.unist.ac.kr/handle/201301/31891
URL
https://pubs.acs.org/doi/10.1021/acs.chemmater.9b04574
DOI
10.1021/acs.chemmater.9b04574
ISSN
0897-4756
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