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Kwon, Soon-Yong
Frontier, Innovative Nanomaterials & Devices (FIND) Lab
Research Interests
  • Semiconductor Epitaxy, thin film technology & surface/ interface Science

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Metal-organic chemical vapor deposition of 2D van der Waals materials-The challenges and the extensive future opportunities

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Title
Metal-organic chemical vapor deposition of 2D van der Waals materials-The challenges and the extensive future opportunities
Author
Lee, Do HeeSim, YeoseonWang, JaewonKwon, Soon-Yong
Issue Date
2020-03
Publisher
AMER INST PHYSICS
Citation
APL MATERIALS, v.8, no.3, pp.030901-1 - 030901-18
Abstract
The last decade has witnessed significant progress in two-dimensional van der Waals (2D vdW) materials research; however, a number of challenges remain for their practical applications. The most significant challenge for 2D vdW materials is the control of the early stages of nucleation and growth of the material on preferred surfaces to eventually create large grains with digital thickness controllability, which will enable their incorporation into high-performance electronic and optoelectronic devices. This Perspective discusses the technical challenges to be overcome in the metal-organic chemical vapor deposition (MOCVD) growth of 2D group 6 transition metal dichalcogenide (TMD) atomic crystals and their heterostructures, as well as future research aspects in vdW epitaxy for 2D TMDs via MOCVD. In addition, we encourage the traditional MOCVD community to apply their expertise in the field of "2D vdW materials," which will continue to grow at an exponential rate.
URI
https://scholarworks.unist.ac.kr/handle/201301/31858
URL
https://aip.scitation.org/doi/10.1063/1.5142601
DOI
10.1063/1.5142601
ISSN
2166-532X
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