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BielawskiChristopher W

Bielawski, Christopher W.
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Selective surface functionalization at regions of high local curvature in graphene

Author(s)
Wu, QingzhiWu, YapingHao, YufengGeng, JianxinCharlton, MatthewChen, ShanshanRen, YujieJi, HengxingLi, HuifengBoukhvalov, Danil W.Piner, Richard D.Bielawski, Christopher W.Ruoff, Rodney S.
Issued Date
2013
DOI
10.1039/c2cc36747e
URI
https://scholarworks.unist.ac.kr/handle/201301/31503
Fulltext
https://pubs.rsc.org/en/content/articlelanding/2013/CC/C2CC36747E#!divAbstract
Citation
CHEMICAL COMMUNICATIONS, v.49, no.7, pp.677 - 679
Abstract
Monolayer graphene was deposited on a Si wafer substrate decorated with SiO2 nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.
Publisher
ROYAL SOC CHEMISTRY
ISSN
1359-7345
Keyword
CHEMICAL-MODIFICATIONSINGLEREACTIVITYSTRAINSPECTROSCOPYEDGESORBITAL AXIS VECTORCONJUGATED ORGANIC-MOLECULES

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