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Thin Film Field-Effect Phototransistors from Bandgap-Tunable, Solution-Processed, Few-Layer Reduced Graphene Oxide Films

Author(s)
Chang, HaixinSun, ZhenhuaYuan, QinghongDing, FengTao, XiaomingYan, FengZheng, Zijian
Issued Date
2010-11
DOI
10.1002/adma.201002229
URI
https://scholarworks.unist.ac.kr/handle/201301/31390
Fulltext
https://onlinelibrary.wiley.com/doi/full/10.1002/adma.201002229
Citation
ADVANCED MATERIALS, v.22, no.43, pp.4872 - 4876
Abstract
Thin film field-effect phototransistors (FETs) can be developed from bandgap-tunable, solution-processed, few-layer reduced graphene oxide (FRGO) films. Large-area FRGO films with tunable bandgaps ranging from 2.2 eV to 0.5 eV can be achieved readily by solution-processing technique such as spin-coating. The electronic and optoelectronic properties of FRGO FETs are found to be closely related to their bandgap energy. The resulting phototransistor has great application potential in the field of photodetection.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
0935-9648
Keyword
TRANSPORT-PROPERTIESTRANSPARENTELECTRODESDEPOSITIONCOMPOSITE

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