File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
Related Researcher

BielawskiChristopher W

Bielawski, Christopher W.
Read More

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Stereoelectronically Directed Photodegradation of Poly(adamantyl Vinyl Ketone)

Author(s)
Sultane, Prakash R.Bielawski, Christopher W.
Issued Date
2019-10
DOI
10.1002/marc.201900302
URI
https://scholarworks.unist.ac.kr/handle/201301/27274
Fulltext
https://onlinelibrary.wiley.com/doi/full/10.1002/marc.201900302
Citation
MACROMOLECULAR RAPID COMMUNICATIONS, v.40, no.19, pp.1900302
Abstract
Adamantyl vinyl ketone (AVK) and its copolymers are synthesized using reversible addition fragmentation chain-transfer (RAFT) methodology and then degraded using UV light. The polymerization of AVK is found to be controlled as indicated by a linear correlation between the molecular weights of the polymers produced and monomer conversion as well as a series of chain extensions. The RAFT method is also used to synthesize random and block copolymers of AVK and methyl methacrylate. Irradiating poly(adamantyl vinyl ketone) (PAVK) with UV light affords a polyolefin and adamantane as the major products. Similar products are obtained, along with poly(methyl methacrylate) (PMMA), when the block copolymer is subjected to UV light. The random copolymer undergoes complete degradation under similar conditions. A mechanism wherein stereoelectronic effects channel photodegradation through Norrish I Type pathways in a manner that preserves the main chain of the polymer during the decomposition process is proposed.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
1022-1336
Keyword (Author)
adamantaneblock copolymersphotodegradationpoly(vinyl ketone) (PVK)RAFT
Keyword
LOW DIELECTRIC-CONSTANTSTRANSITION-TEMPERATURESRAFT POLYMERIZATIONPOLYMERSPHOTOLYSISBLOCKPHOTOCHEMISTRYMETHACRYLATE)COPOLYMERSLIGHT

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.