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Jeong, Hongsik
Future Semiconductor Technology Lab.
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Switching characteristics of magnetic tunnel junctions with a synthetic antiferromagnetic free layer

Author(s)
Lee, Yun KiChun, Byong SunKim, Young KeunHwang, InjunPark, WanjunKim, TaewanJeong, Won-CheolLee, J.Jeong, Hong Sik
Issued Date
2005-10
DOI
10.1109/TMAG.2005.855298
URI
https://scholarworks.unist.ac.kr/handle/201301/27160
Fulltext
https://ieeexplore.ieee.org/document/1519089
Citation
IEEE TRANSACTIONS ON MAGNETICS, v.41, no.10, pp.2688 - 2690
Abstract
The array of synthetic antiferromagnetic magnetic tunnel junctions (MTJs) consisting of the TiN/PtMn (15 nm)/CoFe (1.5 nm)/Ru (0.8 nm)/CoFe (1.5 nm)/AIO (1.2 nm)/NiFe (t(1) nm)/Ru (0.8 nm)/NiFe 42 nm)Ta (10 nm)/TiN structure was fabricated into submicrometer dimensions. Magnetization switching field and magnetic domain structure were investigated by micromagnetic modeling as well as remanent magnetoresistive measurement. Domain structure was investigated to understand switching characteristics. The switching field depends on the thicknesses difference of two magnetic layers consisting of SAF free layer structure. When the thickness difference became 1.5 nm, the switching field was reduced to around 20 Oe with improved squareness.
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
ISSN
0018-9464
Keyword (Author)
magnetic tunnel junctionMRAMswitching fieldsynthetic antiferromagnet

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