File Download
There are no files associated with this item.
SFX Link
- Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
- Chung, Kunook
- Mixed Dimensional Materials and Devices Lab.
Views & Downloads
Detailed Information
Cited time in 
Cited time in 
Cited time in
Metadata Downloads
Catalyst-Free Metal-Organic Chemical Vapor Deposition Growth of InN Nanorods
- Author(s)
- Kim, Min Hwa, Chung, Kunook, Moon, Dae Young, Jeon, Jong-Myeong, Kim, Miyoung, Park, Jinsub, Nanishi, Yasushi, Yi, Gyu-Chul, Yoon, Euijoon
- Issued Date
- 2012-02
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.12, no.2, pp.1645 - 1648
- Abstract
- We demonstrated the successful growth of catalyst-free InN nanorods on (0001) Al2O3 substrates using metal-organic chemical vapor deposition. Morphological evolution was significantly affected by growth temperature. At 710 degrees C, complete InN nanorods with typical diameters of 150 nm and length of similar to 3.5 mu m were grown with hexagonal facets. theta-2 theta X-ray diffraction measurement shows that (0002) InN nanorods grown on (0001) Al2O3 substrates were vertically aligned along c-axis. In addition, high resolution transmission electron microscopy indicates the spacing of the (0001) lattice planes is 0.28 nm, which is very close to that of bulk InN. The electron diffraction patterns also revealed that the InN nanorods are single crystalline with a growth direction along < 0001 > with (10-10) facets.
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- ISSN
- 1533-4880
- Keyword (Author)
- InN Nanorod, Catalyst-Free, Metal-Organic Chemical Vapor Deposition (MOCVD)
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.