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정건욱

Chung, Kunook
Mixed Dimensional Materials and Devices Lab.
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High-quality GaN films grown on chemical vapor-deposited graphene films

Author(s)
Chung, KunookPark, Suk InBaek, HyeonjunChung, Jin-SeokYi, Gyu-Chul
Issued Date
2012-09
DOI
10.1038/am.2012.45
URI
https://scholarworks.unist.ac.kr/handle/201301/26382
Fulltext
https://www.nature.com/articles/am201245
Citation
NPG ASIA MATERIALS, v.4, no.9, pp.e24
Abstract
We report the growth of high-quality GaN films on large-size graphene films for visible light-emitting diodes (LEDs). The graphene films were synthesized by chemical vapor deposition and then transferred onto amorphous silica (SiO2) substrates that do not have an epitaxial relationship with GaN. Before growing the high-quality GaN thin films, ZnO nanowalls were grown on the graphene films as an intermediate layer. The structural and optical characteristics of the GaN films were investigated, and the films exhibited stimulated emission even at room temperature, a highly c-axis-oriented crystal structure, and a preferred in-plane orientation. Visible LEDs that emitted strong electroluminescence under room illumination were fabricated using the GaN thin films. NPG Asia Materials (2012) 4, e24; doi:10.1038/am.2012.45; published online 7 September 2012
Publisher
NATURE PUBLISHING GROUP
ISSN
1884-4049
Keyword (Author)
amorphous substrategallium nitridehybrid heterostructurelarge-size graphene filmlight-emitting diode
Keyword
LIGHT-EMITTING-DIODESOPTOELECTRONIC DEVICESSTIMULATED-EMISSIONLAYERSPHOTOVOLTAICSBLUE

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