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Jeong, Hu Young
UNIST Central Research Facilities (UCRF)
Research Interests
  • Soft material characterization such as graphene using a low kV Cs-corrected TEM

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Single-step synthesis of wrinkled MoSe2 thin films

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Title
Single-step synthesis of wrinkled MoSe2 thin films
Author
Yang, Seung JunLee, YangjinKim, Jin HongKim, Hyuk JinChoi, Byoung KiJeong, Hu YoungKim, KwanpyoChoi, Jin SikChang, Young Jun
Issue Date
2019-03
Publisher
ELSEVIER SCIENCE BV
Citation
CURRENT APPLIED PHYSICS, v.19, no.3, pp.273 - 278
Abstract
Controlled and simple synthesis strategy of two-dimensional (2D) nanomaterials is critical for designing the related heterostructures with different geometries, which influence strain, electronic structures, light-interactions, and surface reactions. Here, we report a single-step growth method for wrinkled MoSe2 thin films on flat SiO2/Si substrates by using high-vacuum co-evaporation. Above the critical film thickness of 15-20 nm, the MoSe2 films start to form wrinkled structure with lateral periodicity of 7-10 μm, which significantly reduces light reflectance in the visible range. We demonstrate formation of the wrinkled pattern on the selective area either by etching the substrate surface or by depositing gold films. In addition, we observe switching of the microscopic growth mode from a layered stacking to a vertically aligned growth, which results in 2D-3D hybrid microstructures. Our single-step synthesis approach might be generalized to obtain wrinkled 2D-3D hybrid nanomaterials and utilized for flexible electronic & optoelectronic devices, efficient solar cells, catalytic electrodes, and anti-counterfeiting applications.
URI
https://scholarworks.unist.ac.kr/handle/201301/25656
URL
https://www.sciencedirect.com/science/article/pii/S1567173918303274?via%3Dihub
DOI
10.1016/j.cap.2018.12.004
ISSN
1567-1739
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