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Chung, Il-Sug
Nano-Optoelectronics Lab.
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Electrical Injection Schemes for Nanolasers

Author(s)
Lupi, AlexandraChung, Il-SugYvind, Kresten
Issued Date
2014-02
DOI
10.1109/LPT.2013.2293511
URI
https://scholarworks.unist.ac.kr/handle/201301/23718
Fulltext
http://ieeexplore.ieee.org/document/6678187/
Citation
IEEE PHOTONICS TECHNOLOGY LETTERS, v.26, no.4, pp.330 - 333
Abstract
Three electrical injection schemes based on recently demonstrated electrically pumped photonic crystal nanolasers have been numerically investigated: 1) a vertical p-i-n junction through a post structure; 2) a lateral p-i-n junction with a homostructure; and 3) a lateral p-i-n junction with a buried heterostructure. Self-consistent laser-diode simulations reveal that the lateral injection scheme with a buried heterostructure achieves the best lasing characteristics at a low current, whereas the vertical injection scheme performs better at a higher current for the chosen geometries. For this analysis, the properties of different schemes, i.e., electrical resistance, threshold voltage, threshold current, and internal efficiency as energy requirements for optical interconnects are compared and the physics behind the differences is discussed.
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
ISSN
1041-1135

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