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Ruoff, Rodney S.
Center for Multidimensional Carbon Materials (CMCM)
Research Interests
  • Next generation carbons, ultrathin sp3-bonded carbon sheets, negative curvature (‘Schwartzites’) carbons, sp3/sp2 hybrid carbon materials, model compounds for novel carbon materials, reaction mechanisms

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Chemical Vapor Deposition Growth of Graphene and Related Materials

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Title
Chemical Vapor Deposition Growth of Graphene and Related Materials
Author
Kitaura, RyoMiyata, YasumitsuXiang, RongHone, JamesKong, JingRuoff, Rodney S.Maruyama, Shigeo
Issue Date
2015-12
Publisher
PHYSICAL SOC JAPAN
Citation
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, v.84, no.12, pp.121013
Abstract
Research on atomic layers including graphene, hexagonal boron nitride (hBN), transition metal dichalcogenides (TMDCs) and their heterostructures has attracted a great deal of attention. Chemical vapor deposition (CVD) can provide large-area structure-defined high-quality atomic layer samples, which have considerably contributed to the recent advancement of atomic-layer research. In this article, we focus on the CVD growth of various atomic layers and review recent progresses including (1) the CVD growth of graphene using methane and ethanol as carbon sources, (2) the CVD growth of hBN using borazine and ammonia borane, (3) the CVD growth of various TMDCs using single and multi-furnace methods, and (4) CVD growth of vertical and lateral heterostructures such as graphene/hBN, MoS2/graphite, WS2/hBN and MoS2/WS2
URI
https://scholarworks.unist.ac.kr/handle/201301/18006
URL
http://journals.jps.jp/doi/10.7566/JPSJ.84.121013
DOI
10.7566/JPSJ.84.121013
ISSN
0031-9015
Appears in Collections:
CHM_Journal Papers
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