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Park, Lee Soon
School of Materials Science and Engineering
Research Interests
  • Flexible OLED new materials, process and fabrication
  • Touch Screen Panel(TSP) new materials and process new materials and process
  • Nano-materials synthesis and application (Ag nano-wire and metal mesh electrode)

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Photosensitive paste formulation and photolithographic process for the fabrication of barrier ribs in PDP: Effect of surface-treated fumed silica

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Title
Photosensitive paste formulation and photolithographic process for the fabrication of barrier ribs in PDP: Effect of surface-treated fumed silica
Author
Hur, YoungjuneKim, Soon HakJang, Dong GyuPark, Lee SoonKwon, Younghwan
Keywords
Barrier rib; Fumed silica; Photolithographic process; Photosensitive paste; Plasma display panel
Issue Date
2006-12
Publisher
TAYLOR & FRANCIS LTD
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.459, no., pp.247 - 253
Abstract
In this work, formulation of photosensitive pastes was investigated to fabricate barrier ribs of PDP by a photolithographic process. Optimum paste compositions could be achieved by the formulation of alkali-developable polymeric binders, functional monomers, a photoinitiator, and a solvent with barrier rib powders of which surface was treated with fumed silica particles. It was applied to the paste and was found that photolithographic patterns of barrier ribs could be obtained with good resolution up to 110 similar to 120 mu m of height and 60 similar to 80 mu m of width after sintering. This could be explained by increased light transmittance efficiency through UV light guide channel formed with an aid of nano-sized fumed silica used for surface treatment of barrier rib powders
URI
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DOI
10.1080/15421400600930383
ISSN
1542-1406
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MSE_Journal Papers
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