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Synthesis of imide UV monomers for application to interdielectric layer of TFT-LCD array

Author(s)
Hur, YoungjuneKim, Soon HakKim, Hyo-JinHan, Yoon SooPark, Lee SoonKwon, Younghwan
Issued Date
2007-01
DOI
10.1080/15421400701495575
URI
https://scholarworks.unist.ac.kr/handle/201301/17145
Fulltext
http://www.tandfonline.com/doi/abs/10.1080/15421400701495575
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.470, pp.199 - 205
Abstract
Novel negative-type photocurable imide UV monomers were synthesized and characterized for an application to interdielectric layer in TFT-LCD array. Two different imide-type UV monomers were synthesized through 2 step reaction. In addition, alkali developable polymer matrix was also prepared by free radical random copolymerization of benzylmethacrylate and methacrylic acid in THF at 65 degrees C. It was found from photolithographic process that via-hole with good resolution were obtained using optimum formulations, suitable for spin coating process, of negative-type imide UV monomers, photoinitiator, UV oligomer, and alkali developable polymer matrix
Publisher
TAYLOR & FRANCIS LTD
ISSN
1542-1406
Keyword (Author)
interdielectric layernegative-type imide UV monomerphotolithographic processTFT-LCD

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