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Park, Lee Soon
School of Materials Science and Engineering
Research Interests
  • Flexible OLED new materials, process and fabrication
  • Touch Screen Panel(TSP) new materials and process new materials and process
  • Nano-materials synthesis and application (Ag nano-wire and metal mesh electrode)

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Properties of indium tin oxide on polymer films deposited by low-frequency magnetron sputtering method

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Title
Properties of indium tin oxide on polymer films deposited by low-frequency magnetron sputtering method
Author
Jung, Sang KoounKim, Myung ChanSohn, Sang HoPark, Duck KyuLee, Sung HoPark, Lee Soon
Keywords
indium tin oxide, magnetron sputtering, optical transmittance, resistivity, roughness, sheet resistance, thin film
Issue Date
2006-12
Publisher
TAYLOR & FRANCIS LTD
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.459, no., pp.167 - 177
Abstract
In this study, we introduce indium tin oxide (ITO) thin films grown by using low-frequency (60 Hz) magnetron sputtering method. Characteristics of the ITO thin films deposited on polyethersulfone (PES) substrates are investigated. Experiments were carried out as a function of deposition time and substrate temperature. ITO thin films on PES substrate revealed amorphous structure. The optical transmittance, the sheet resistance and the resistivity of the films decreased with the increasing deposition time. The sheet resistance and the roughness of the films increased with the increasing substrate temperature. Roughness values of ITO films on PES substrate deposited at various substrate temperatures are Ra (< 2 nm), Rms (< 3 nm) and Rp-v (< 10 nm). The experimental results confirm that the films with good qualities in surface morphology, transmittance and electrical conduction can be grown by a low-frequency magnetron sputtering method
URI
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DOI
10.1080/15421400600930151
ISSN
1542-1406
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MSE_Journal Papers
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