Methacrylate homo- and copolymers containing photosensitive abietate group: Their high thermal stability, unique photocrosslinking behavior, transparency, and photolithographic application
- Author(s)
-
Kwak, Giseop, Choi, Jae-Ung, Seo, Kwan-Ho, Park, Lee Soon, Hyun, Seok-Hee, Kim, Woo-Sik
- Issued Date
-
2007-05
- DOI
-
10.1021/cm062861y
- URI
-
https://scholarworks.unist.ac.kr/handle/201301/17023
- Fulltext
-
http://pubs.acs.org/doi/abs/10.1021/cm062861y
- Citation
-
CHEMISTRY OF MATERIALS, v.19, no.11, pp.2898 - 2902
- Abstract
-
The monomer methacryloyloxyethyl abietate (2) was synthesized by a simple two-step reaction starting from abietic acid. The homopolymerization of 2 and its copolymerization with MMA using AIBN as an initiator provided high-molecular-weight polymers 3-6 (10 x 10(3) < M-n < 70 x 10(3)) in high yields. These polymers were well-dissolved in organic solvents. The glass-transition temperatures, T-g, of all polymers were higher than 130 degrees C, much higher than that of PMMA. No melting points, T-m, were observed. Their decomposition temperatures were very high, as T-5 wt % loss > 300 degrees C. These results indicate that these polymers are thermally stable and glassy at room temperature. The absorption bands due to the conjugated carbon-carbon double bonds within the abietate group significantly decreased with an increase in the exposure doses. Normalized absorbance as a function of UV exposure doses nonlinearly changed because of the occurrence of a certain threshold at 1.0 J/cm(2) in all polymers. Solvent extraction experiment revealed that interchain crosslinking effectively occurred even in copolymers with relatively low amounts of the abietate group. The polymer films showed a clear transparency of more than 90%. Photolithography of the polymer films provided high-resolution pattern images
- Publisher
-
AMER CHEMICAL SOC
- ISSN
-
0897-4756
- Keyword
-
ACID
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.