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Enhanced Optical Output Power of Tunnel Junction GaN-Based Light Emitting Diodes with Transparent Conducting Al and Ga-Codoped ZnO Thin Films

Author(s)
Kim, Tae HoonJu, Young-GuPark, Lee SoonLee, Sang HernBaek, Jong HyeobYu, Young Moon
Issued Date
2010-09
DOI
10.1143/JJAP.49.091002
URI
https://scholarworks.unist.ac.kr/handle/201301/16955
Fulltext
http://iopscience.iop.org/article/10.1143/JJAP.49.091002/meta;jsessionid=9585215F176D283A3BB8974B92784283.c1
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.49, no.9
Abstract
High quality Al and Ga-codoped ZnO (AGZO) thin films were successfully deposited both on sapphire substrates and GaN-based light emitting diodes (LED) with a tunnel junction (TJ) layer by using the radio frequency magnetron sputtering technique at room temperature. The AGZO thin films grown on sapphire substrate showed high transparency (96.3% at 460 nm) and low resistivity (6.8 x 10(-4) Omega cm). The AGZO thin films deposited on the GaN-based LED with a TJ layer exhibited weak ohmic behavior although it improved slightly with the annealing. The optical output power of the TJ GaN-based LED with an AGZO transparent conducting layer was about 12.6mW at 20 mA, and the external quantum efficiency was 23.0%. These values are approximately 1.7 times larger than that of the TJ GaN-based LED with a conventional Ni/Au layer. (C) 2010 The Japan Society of Applied Physic
Publisher
JAPAN SOC APPLIED PHYSICS
ISSN
0021-4922

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