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Park, Kibog
Emergent Materials & Devices Lab.
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Quantum well state of self-forming 3C-SiC inclusions in 4H SiC determined by ballistic electron emission microscopy

Author(s)
Ding, YPark, KibogPelz, JPPalle, KCMikhov, MKSkromme, BJMeidia, HMahajan, S
Issued Date
2004-01
DOI
10.1103/PhysRevB.69.041305
URI
https://scholarworks.unist.ac.kr/handle/201301/10074
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=1542411666
Citation
PHYSICAL REVIEW B, v.69, no.4, pp.1 - 4
Abstract
High-temperature-processing-induced double-stacking-fault 3C-SiC inclusions in 4H SiC were studied with ballistic electron emission microscopy in ultrahigh vacuum. Distinctive quantum well structures corresponding to individual inclusions were found and the quantum well two-dimensional conduction band minimum was determined to be approximately 0.53 ± 0.06 eV below the conduction band minimum of bulk 4H SiC. Macroscopic diode I-V measurements indicate no significant evidence of metal/semiconductor interface state variation across the inclusions.
Publisher
AMERICAN PHYSICAL SOC
ISSN
2469-9950

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