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Improvement of the Diffusion Barrier Performance of Ru by Incorporating a WNx Thin Film for Direct-Plateable Cu Interconnects File

Sari, Windu , Eom, Tae-Kwang , Jeon, Chan-Wook , Sohn, Hyunchul , Kim, Soo-Hyun

Article Issue Date2009-04 View111
Integration of reduced graphene oxide into organic field-effect transistors as conducting electrodes and as a metal modification layer File

Lee, Chen-Guan , Park, Sungjin , Ruoff, Rodney S. , Dodabalapur, Ananth

Article Issue Date2009-07 View88
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