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Improved interface quality of atomic-layer-deposited ZrO2 metal-insulator-metal capacitors with Ru bottom electrodes File

Lee, Jae Hwan , Park, Bo-Eun , Thompson, David , Choe, Myeonggi , Lee, Zonghoon , Oh, Il-Kwon , Kim, Woo-Hee , Kim, Hyungjun

Article Issue Date2020-05 View145
In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides File

Oh, Il-Kwon , Kim, Kangsik , Lee, Zonghoon , Song, Jeong-Gyu , Lee, Chang Wan , Thompson, David , Lee, Han-Bo-Ram , Kim, Woo-Hee , Maeng, Wan Joo , Kim, Hyungjun

Article Issue Date2015-05 View107
Nonvolatile memory characteristics of atomic layer deposited Ru nanocrystals with a SiO2/Al2O3 bilayered tunnel barrier File

Lee, Do-Joong , Yim, Sung-Soo , Kim, Ki-Su , Kim, Soo-Hyun , Kim, Ki-Bum

Article Issue Date2010-01 View96
Stacking direction dependent Raman mode, wake-up alleviation, and coercive-field reduction in HfO2/ZrO2 superlattices File

Fahrvandi, Hamoon , Kumar, Pawan , Lee, Jun Hee

Article Issue Date2025-11 View32
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