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Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant File

Hong, Tae Eun , Mun, Ki-Yeung , Choi, Sang-Kyung , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Kim, Woo Kyoung , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2012-07 View133
Cu direct electrodeposition using step current for superfilling on Ru-Al2O3 layer File

Kim, Myung Jun , Choe, Seunghoe , Kim, Hoe Chul , Lee, Seung-Joon , Kim, Soo-Hyun , Kwon, Oh Joong , Kim, Jae Jeong

Article Issue Date2014-11 View110
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