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Highly conductive ALD-WCx thin films using a novel fluorine-free W precursor for Cu & Ru interconnects

Seo, Dongbeom , Kim, Sang Bok , Kim, Soo-Hyun

Conference Paper Issue Date2025-12-11 View9
Highly Conductive ALD-WCₓ Ultrathin Diffusion Barriers for Cu and Ru Interconnects

Seo, Dongbeom , Kim, Sang Bok , Kim, Soo-Hyun

Conference Paper Issue Date2025-11-06 View14
Highly conductive Tungsten Carbide Thin Films Grown by Atomic Layer Deposition Using a Novel Fluorine-Free Tungsten Precursor for Copper and Ruthenium Interconnects File

Seo, Dongbeom

Thesis Issue Date2026-02 View0
Highly-conductive ALD-WCx thin films using a new fluorine-free W precursor for Cu & Ru interconnects

Seo, Dongbeom , 김상복 , Kim, Soo-Hyun

Conference Paper Issue Date2025-06-24 View9
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