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Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant File

Hong, Tae Eun , Mun, Ki-Yeung , Choi, Sang-Kyung , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Kim, Woo Kyoung , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2012-07 View133
Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization File

Yeo, Seungmin , Choi, Sang-Hyeok , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2013-11 View74
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition File

Park, Ji-Yoon , Yeo, Seungmin , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Min-Kyu , Kim, Hyungjun , Hong, Tae Eun , Lee, Do-Joong

Article Issue Date2014-10 View113
Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen File

Yeo, Seungmin , Park, Ji-Yoon , Lee, Seung-Joon , Lee, Do-Joong , Seo, Jong Hyun , Kim, Soo-Hyun

Article Issue Date2015-04 View95
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