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Process Variation Tolerant 28-nm Ternary CMOS Technology with Gate-Inderlap Enginnering

Lee, Kwan Yong , Kim, Woo-Seok , Yeo, Sang Hun , Jang, In Jun , Choi, Young-Eun , Kimm, Myoung , Jeong, Yesong , Park, Jun Young , 류민우 , Kim, Kyung Rok

Conference Paper Issue Date2025-02-14 View4
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