| 2008-06 | A bilayer diffusion barrier of ALD-Ru/ALD-TaCN for direct plating of Cu | Kim, Soo-Hyun; Kim, Hyun Tae; Yim, Sung-Soo; Lee, Do-Joong; Kim, Ki-Su; Kim, Hyun-Mi; Kim, Ki-Bum; Sohn, Hyunchul | ARTICLE | 34 |
| 2012-10 | A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects | Eom, Tae-Kwang; Sari, Windu; Cheon, Taehoon; Kim, Soo-Hyun; Kim, Woo Kyoung | ARTICLE | 32 |
| 2006-07 | A comparative study of the atomic-layer-deposited tungsten thin films as nucleation layers for W-plug deposition | Kim, Soo-Hyun; Kwak, Nohjung; Kim, Jinwoong; Sohn, Hyunchul | ARTICLE | 40 |
| 2016-04 | A controlled growth of WNx, and WCx thin films prepared by atomic layer deposition | Kim, Jun Beom; Jang, Byeonghyeon; Lee, Hyun-Jung; Han, Won Seok; Lee, Do-Joong; Lee, Han-Bo-Ram; Hong, Tae Eun; Kim, Soo-Hyun | ARTICLE | 34 |
| 2020-10 | A review on atomic layer deposited buffer layers for Cu(In,Ga)Se-2 (GIGS) thin film solar cells: Past, present, and future | Sinha, Soumyadeep; Nandi, Dip K.; Pawar, Pravin S.; Kim, Soo-Hyun; Heo, Jaeyeong | ARTICLE | 30 |
| 2023-01 | A review on metal-organic frameworks for the removal of hazardous environmental contaminants | Jeong, Changyoon; Ansari, Mohd Zahid; Hakeem Anwer, Abdul; Kim, Soo-Hyun; Nasar, Abu; Shoeb, Mohd; Mashkoor, Fouzia | ARTICLE | 129 |
| 2016-04 | A Study on a Relationship Between Sputtering Condition and Electrochemical Property of Molybdenum Thin Films in Phosphoric Acid Solution | Seo, Bo-Hyun; Kim, Hongsik; Choe, HeeHwan; Jeon, Jae-Hong; Winkler, Joerg; Lee, Yonguk; Kim, Soo-Hyun; Seo, Jong Hyun | ARTICLE | 30 |
| 2016-04 | A Study on Chemical and Mechanical Properties of NiCrSn Films for Flexible Copper Interconnect | Park, In-Sun; Kim, Hongsik; Kim, Byoung O.; Choe, HeeHwan; Jeon, Jae-Hong; Ahn, Joongkyu; Kim, Soo-Hyun; Seo, Jong Hyun | ARTICLE | 32 |
| 2011-10 | ALD-Grown Al2O3 as a Diffusion Barrier for Stainless Steel Substrates for Flexible Cu(InGa)Se-2 Solar Cells | Park, Hyeonwook; Kim, Sung Cheol; Bae, Hae Chul; Cheon, Taehoon; Kim, Soo-Hyun; Kim, Woo Kyoung | ARTICLE | 38 |
| 2016-08 | Application of Pulsed Chemical Vapor Deposited Tungsten Thin Film as a Nucleation Layer for Ultrahigh Aspect Ratio Tungsten-Plug Fill Process | Jang, Byeonghyeon; Kim, Soo-Hyun | ARTICLE | 32 |
| 2021-03 | Artificially induced normal ferroelectric behaviour in aerosol deposited relaxor 65PMN-35PT thick films by interface engineering | Thakre, Atul; Kumar, Ajeet; Lee, Min-Young; Patil, Deepak Rajaram; Kim, Soo-Hyun; Ryu, Jungho | ARTICLE | 34 |
| 2021-03 | Atomic layer deposited Mo2N thin films using Mo(CO)(6) and NH3 plasma as a Cu diffusion barrier | Joo, Yong-Hwan; Nandi, Dip K.; Ramesh, Rahul; Jang, Yujin; Bae, Jong-Seong; Cheon, Taehoon; Kim, Soo-Hyun | ARTICLE | 30 |
| 2017-02 | Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction | Oh, Seungtaeg; Kim, Jun Beom; Song, Jun Tae; Oh, Jihun; Kim, Soo-Hyun | ARTICLE | 30 |
| 2016-07 | Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization | Kim, Jun Beom; Kim, Soo-Hyun; Han, Won Seok; Lee, Do-Joong | ARTICLE | 38 |
| 2022-10 | Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects | Kim, Youn-Hye; Kim, Minsu; Kotsugi, Yohei; Cheon, Taehoon; Mohapatra, Debananda; Jang, Yujin; Bae, Jong-Seong; Hong, Tae Eun; Ramesh, Rahul; An, Ki-Seok; Kim, Soo-Hyun | ARTICLE | 46 |
| 2016-11 | Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects | Lee, Hyun-Jung; Hong, Tae Eun; Kim, Soo-Hyun | ARTICLE | 30 |
| 2018-09 | Atomic layer deposited zinc oxysulfide anodes in Li-ion batteries: an efficient solution for electrochemical instability and low conductivity | Sinha, Soumyadeep; Ramasamy, Hari Vignesh; Nandi, Dip K.; Didwal, Pravin N.; Cho, Jae Yu; Park, Chan-Jin; Lee, Yun-Sung; Kim, Soo-Hyun; Heo, Jaeyeong | ARTICLE | 36 |
| 2019-01 | Atomic layer deposited-ZnO@3D-Ni-foam composite for Na-ion battery anode: A novel route for easy and efficient electrode preparation | Sinha, Soumyadeep; Didwal, Pravin N.; Nandi, Dip K.; Cho, Jae Yu; Kim, Soo-Hyun; Park, Chan-Jin; Heo, Jaeyeong | ARTICLE | 38 |
| 2016-07 | Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules | Jang, Byeonghyeon; Kim, Soo-Hyun | ARTICLE | 32 |
| 2011-10 | Atomic Layer Deposition of Co Using N-2/H-2 Plasma as a Reactant | Yoon, Jaehong; Lee, Han-Bo-Ram; Kim, Doyoung; Cheon, Taehoon; Kim, Soo-Hyun; Kim, Hyungjun | ARTICLE | 40 |
