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Growth of High-Quality InN Thin Films by Plasma-Enhanced ALD Using a Novel Indium Precursor and NH3 Plasma

Kim, Yejun , 김상복 , Kim, Soo-Hyun

Conference Paper Issue Date2025-12-11 View5
Highly-conductive ALD-WCx thin films using a new fluorine-free W precursor for Cu & Ru interconnects

Seo, Dongbeom , 김상복 , Kim, Soo-Hyun

Conference Paper Issue Date2025-06-24 View9
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