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- Kim, So Youn
- Laboratory for Soft Materials Nanophysics
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Metal-Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio
- Issued Date
- 2014-02
- Citation
- ADVANCED MATERIALS, v.26, no.5, pp.791 - 795
- Abstract
- Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane)diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.
- Publisher
- WILEY-V C H VERLAG GMBH
- ISSN
- 0935-9648
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