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Jeong, Changwook
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Nanoscale-nMOSFET junction design: Quantum transport approach

Author(s)
Pourghaderi, M. AliPark, ChulwooKim, JongcholJeong, ChangwookChung, Won-YoungLee, Keun-HoPark, Hong-HyunPham, Anh-TuanJin, SeonghoonChoi, Woosung
Issued Date
2017-09-07
DOI
10.23919/SISPAD.2017.8085262
URI
https://scholarworks.unist.ac.kr/handle/201301/58523
Citation
2017 International Conference on Simulation of Semiconductor Processes and Devices, pp.53 - 56
Abstract
Employing quantum transport solver, we have demonstrated the impact of junction proximity and abruptness on device performance. To entail the discrete dopant effect accurately, impurity scattering has been introduced in non-perturbative way. The electrostatic metrics and effective current have been evaluated for practical dimensions and technologically relevant junctions. A simple guideline for junction design has been concluded.
Publisher
Institute of Electrical and Electronics Engineers Inc.

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