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정창욱

Jeong, Changwook
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dc.citation.conferencePlace JA -
dc.citation.conferencePlace Kamakura -
dc.citation.endPage 56 -
dc.citation.startPage 53 -
dc.citation.title 2017 International Conference on Simulation of Semiconductor Processes and Devices -
dc.contributor.author Pourghaderi, M. Ali -
dc.contributor.author Park, Chulwoo -
dc.contributor.author Kim, Jongchol -
dc.contributor.author Jeong, Changwook -
dc.contributor.author Chung, Won-Young -
dc.contributor.author Lee, Keun-Ho -
dc.contributor.author Park, Hong-Hyun -
dc.contributor.author Pham, Anh-Tuan -
dc.contributor.author Jin, Seonghoon -
dc.contributor.author Choi, Woosung -
dc.date.accessioned 2023-12-19T18:11:34Z -
dc.date.available 2023-12-19T18:11:34Z -
dc.date.created 2022-04-11 -
dc.date.issued 2017-09-07 -
dc.description.abstract Employing quantum transport solver, we have demonstrated the impact of junction proximity and abruptness on device performance. To entail the discrete dopant effect accurately, impurity scattering has been introduced in non-perturbative way. The electrostatic metrics and effective current have been evaluated for practical dimensions and technologically relevant junctions. A simple guideline for junction design has been concluded. -
dc.identifier.bibliographicCitation 2017 International Conference on Simulation of Semiconductor Processes and Devices, pp.53 - 56 -
dc.identifier.doi 10.23919/SISPAD.2017.8085262 -
dc.identifier.scopusid 2-s2.0-85039046503 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/58523 -
dc.language 영어 -
dc.publisher Institute of Electrical and Electronics Engineers Inc. -
dc.title Nanoscale-nMOSFET junction design: Quantum transport approach -
dc.type Conference Paper -
dc.date.conferenceDate 2017-09-07 -

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