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Atomic Layer Deposition of Ru for Replacing Cu-Interconnects File

Kotsugi, Yohei , Han, Seung-Min , Kim, Youn-Hye , Cheon, Taehoon , Nandi, Dip K. , Ramesh, Rahul , Yu, Neung-Kyung , Son, Kirak , Tsugawa, Tomohiro , Ohtake, Shigeyuki , et al

Article Issue Date2021-07 View3
Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant File

Jung, Jae-Hun , Lee, Seung-Joon , Lee, Hyun-Jung , Lee, Min Young , Cheon, Taehoon , Bae, So Ik , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , et al

Article Issue Date2015-11 View3
Effect of Chemical Structure on Polymer-Templated Growth of Graphitic Nanoribbons File

Liu, Nan , Kim, Kwanpyo , Jeong, Hu Young , Hsu, Po-Chun , Cui, Yi , Bao, Zhenan

Article Issue Date2015-09 View7
Effects of annealing on the properties of atomic layer deposited Ru thin films deposited by NH3 and H-2 as reactants File

Lee, Seung-Joon , Kim, Soo-Hyun

Article Issue Date2016-08 View2
Electrostatic-force-directed assembly of ag nanocrystals onto vertically aligned carbon nanotubes File

Lu, Ganhua , Zhu, Liying , Wang, Pengxiang , Chen, Junhong , Dikin, Dmitriy A. , Ruoff, Rodney S. , Yu, Ying , Ren, Z. F.

Article Issue Date2007-12 View2
Facile synthesis of ZnO microrod photodetectors by solid-state reaction File

Lee, HanJin , Jung, Hyun Kyu , Kim, Young Eun , Beom, Keonwon , Mun, Jeong Heum , Hong, A-Ra , Jang, Ho Seong , Park, Jong-Sung , Yoon, Tae-Sik , Kim, Dong Hun

Article Issue Date2020-06 View5
Optical design of ZnO-based antireflective layers for enhanced GaAs solar cell performance File

Lee, Hye Jin , Lee, Jae Won , Kim, Hee Jun , Jung, Dae-Han , Lee, Ki-Suk , Kim, Sang Hyeon , Geum, Dae-myeong , Kim, Chang Zoo , Choi, Won Jun , Baik, Jeong Min

Article Issue Date2016-01 View7
Orientation-Dependent Strain Relaxation and Chemical Functionalization of Graphene on a Cu(111) Foil File

Li, Bao-Wen , Luo, Da , Zhu, Liyan , Zhang, Xu , Jin, Sunghwan , Huang, Ming , Ding, Feng , Ruoff, Rodney S.

Article Issue Date2018-03 View11
Plasma-free atomic layer deposition of Ru thin films using H-2 molecules as a nonoxidizing reactant File

Lee, Seung-Joon , Kim, Soo-Hyun , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , Kim, Sangdeok , Yeom, Seungjin , Lee, Do-Joong

Article Issue Date2016-05 View2
The formation of a dielectric SiNxCy sealing layer using an atomic layer deposition technique File

Kim, Doyoung , Kim, Soo-Hyun , Kim, Hyungjun

Article Issue Date2015-01 View3
Thermal Atomic Layer Deposition (ALD) of Ru Films for Cu Direct Plating File

Choi, Sang-Hyeok , Cheon, Taehoon , Kim, Soo-Hyun , Kang, Dae-Hwan , Park, Gye-Soon , Kim, Sunjung

Article Issue Date2011-03 View3
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